| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid material vaporizing and feeding device capable of controlling occurrence of pressure fluctuation in a vaporization container and abnormal control or the like caused by secondary pressure fluctuation, and feeding gas at a consistent flow rate to a reaction container. SOLUTION: In the liquid material vaporizing and feeding device 10, liquid material is fed to a heated vaporization container 20 and vaporized therein. The vaporized gas passes through a flow rate control unit 30, and fed to a reaction container R. The flow rate control unit 30 has a control valve 40 and a pressure detection part 50. The pressure detection part 50 comprises a throttling part 54 consisting of a (sonic) nozzle or an orifice, and a pressure sensor 52 located on the upstream side thereof. The pressure sensor 52 detects the primary pressure of the throttling part 54, the control valve 40 is opened/closed on the basis of the detected pressure, and occurrence of abnormal control caused by pressure fluctuation in the vaporization container 20 can be controlled by controlling the flow rate. COPYRIGHT: (C)2004,JPO&NCIPI
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