发明名称 ULTRAPURE WATER MANUFACTURING SYSTEM AND ITS OPERATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide an ultrapure water manufacturing system which is capable of rapidly supplying ultrapure water of stable water quality even after exchanging cartridge polishers in secondary pure water manufacturing systems. SOLUTION: The ultrapure water manufacturing system has the plurality of secondary pure water manufacturing systems equipped with the exchangeable cartridge polishers (hereafter the "polishers") and is constituted by connecting the outlet line of the polishers of the high water quality secondary pure water manufacturing system (hereafter the "former system") for which high water quality is required and the outlet line of the polishers of the low water quality secondary pure water manufacturing system (hereafter the "latter system") for which relatively low water quality is required in such a manner that the supply destinations of the treated water of the respective polishers can be changed over with each other. In the method for operating the ultrapure water manufacturing system, the polishers of the former system are exchanged, then the water treated with the polishers of the former system is supplied to the outlet line of the polishers of the latter system until the period for stabilization of the treatment performance previously determined by testing elapses, and the water treated with the polishers of the latter system is supplied to the outlet line of the polishers of the former system and the normal supply is resumed after the lapse of the period for stabilization of the treatment performance. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004261768(A) 申请公布日期 2004.09.24
申请号 JP20030056874 申请日期 2003.03.04
申请人 JAPAN ORGANO CO LTD;RENESAS TECHNOLOGY CORP 发明人 KAWADA KAZUHIKO;TAKAHASHI KENJI;NAGAFUNE TAIRA;ARAKI OSAMU;MIYAMOTO YOSHIO;MIYATA KAZUHIRO
分类号 C02F1/44;C02F1/00;C02F1/42;(IPC1-7):C02F1/42 主分类号 C02F1/44
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