发明名称 |
APPARATUS FOR COMING INTO CONTACT WITH HIGH TEMPERATURE GAS |
摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus suitable for bringing a high temperature gas, for example, hydrogen into contact with tetrachlorosilane. SOLUTION: A reactor 100 is used for the hydrogenation of tetrachlorosilane. The reactor 100 has at least a component prepared from a silicon carbide based structural material. The reactor 100 includes a shell 101 capable of pressurization, a heat insulating material 102 surrounded by the shell 101 capable of pressurization, a heating element 106 surrounded by the insulating material 102 and a reaction chamber 107 surrounded by the heating element 106. COPYRIGHT: (C)2004,JPO&NCIPI
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申请公布号 |
JP2004262753(A) |
申请公布日期 |
2004.09.24 |
申请号 |
JP20040059641 |
申请日期 |
2004.03.03 |
申请人 |
HEMLOCK SEMICONDUCTOR CORP |
发明人 |
AGRAWAL MANOJ;BAUER DANA;PIPPENGER ROBERT |
分类号 |
B01J3/00;B01J3/04;B01J19/00;B01J19/02;B01J19/24;C01B33/03;(IPC1-7):C01B33/03 |
主分类号 |
B01J3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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