| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection aligner usable with high precision which can prevent a unit such as a wafer stage from being adversely affected and is thermally deformed by an exposure action executed for the purpose of a preliminary exposure other than the exposure. SOLUTION: The projection exposing device has an illumination optical system for illuminating a pattern on an original sheet with a flux from a light source means; a projection optical system for projecting a light from the pattern on a substrate; and a substrate stage on which the substrate is mounted to drive. A baffle is disposed on the substrate stage via an insulation board and/or a cooling means. COPYRIGHT: (C)2004,JPO&NCIPI
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