发明名称 WAFER FOR CALIBRATING FOREIGN MATTER MEASURING INSTRUMENT AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a wafer for calibrating a foreign matter measuring instrument and its manufacturing method for contributing to the enhancement of sensitivity calibration accuracy without causing an increase in a manufacturing cost. SOLUTION: Pseudo foreign matter P is formed out of projection parts 2 made of a high melting point metal formed on an upper face of the wafer 1 and a coating film 3 formed on the whole of the upper face of the wafer 1 including the projection part 2. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004264124(A) 申请公布日期 2004.09.24
申请号 JP20030054001 申请日期 2003.02.28
申请人 SEIKO EPSON CORP 发明人 OWAKU TAKESHI
分类号 G01N21/93;G01N21/956;H01L21/66;(IPC1-7):G01N21/93 主分类号 G01N21/93
代理机构 代理人
主权项
地址