发明名称 METHOD AND APPARATUS FOR DEPOSITING AMORPHOUS CARBON FILM
摘要 PROBLEM TO BE SOLVED: To provide a technique for efficiently forming an amorphous carbon film at a low cost. SOLUTION: This apparatus for forming the amorphous carbon film is characteristically provided with a deposition furnace 11, plurality of work fixing tools 23, which hold plurality of the platy works 22 in a layered state in the vertical direction in the range of 2-30 mm interval between the facing surfaces of the abutted two platy works 22 at parallel in the vertical direction and are disposed like a ring at the equal interval in the furnace chamber of the deposition furnace 11 and energized as a negative electrode, nozzles 31, 32 which are constituted of the plurality pieces disposed in one or more and as the ring-state in the equal interval at a centrifugal direction side at the center of the work fixing tools 23 disposed like the ring, and a plasma electric source 16 connected to at least the work fixing tools 23. The supplied gas pressure, ranges 13-1330 Pa and the plasma electric source is operated so that a sheath width becomes 2-30 mm and thus, the stable discharge can be obtained. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004263292(A) 申请公布日期 2004.09.24
申请号 JP20030379077 申请日期 2003.11.07
申请人 TOYODA MACH WORKS LTD;TOYOTA CENTRAL RES & DEV LAB INC;NIPPON DENSHI KOGYO KK 发明人 ANDO JUNJI;SAKAI NAOYUKI;SAITO TOSHIYUKI;NAKANISHI KAZUYUKI;MORI HIROYUKI;TACHIKAWA HIDEO;ITO KYOJI;FUJIOKA MIKIO;FUNAKI YOSHIYUKI
分类号 F16D13/62;C23C16/26;C23C16/50;(IPC1-7):C23C16/26 主分类号 F16D13/62
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