EXPOSURE APPARATUS USING PATTERNED EMITTER AND FABRICATING METHOD THEREOF TO EMIT ELECTRONS BY UTILIZING ELECTRON BEAM SOURCE

摘要

PURPOSE: An exposure apparatus using a patterned emitter and a fabricating method thereof are provided to emit electrons by utilizing an electron beam source using a semiconductor layer as a mask. CONSTITUTION: A superconducting emitter(110) is formed by a superconducting plate(111), a dielectric plate(113) laminated on the superconducting plate, and a semiconductor layer(114) formed on the dielectric plate corresponding to a substrate holder. A heating source(118) is used for heating the superconducting emitter. A magnet or DC magnetic field generator(130) is installed at the outside of the emitter and the substrate holder in order to control paths of electrons emitted from the superconducting emitter.