| 摘要 |
A polymer comprising recurring units of formula (1-1) or (1-2) wherein R<1>, R<2>, R<3 >and R<4 >are H or alkyl, or R<1 >and R<2>, and R<3 >and R<4 >taken together may form a ring with each pair being alkylene, and k is 0 or 1 and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
|
