WET-ETCH CLEANING APPARATUS TO PREVENT POLLUTION OF ETCHING SOLUTION

摘要

PURPOSE: A wet-etch cleaning apparatus is provided to prevent pollution of an etching solution and improve the etch efficiency by injecting deionized water to a bath member in a process for exchanging the etching solution. CONSTITUTION: A wet-etch cleaning apparatus includes a bath member and a cleaning part. The bath member is used for covering a top part of a chemical tank(11) for storing the predetermined amount of etching solution. The cleaning part(20) is formed at one side of an upper part of the bath member. The cleaning part is elevated to a top part of the bath member in order to inject deionized water to the bath member when the etching solution of the chemical tank is exchanged. The cleaning part is formed with a water supply pipe(21), a nozzle(22), and a transferring device(23).