发明名称 |
SEMICONDUCTOR DEVICE CAPABLE OF BEING MINIATURIZED ON SURFACE IN PARALLEL WITH MAIN SURFACE OF SEMICONDUCTOR SUBSTRATE |
摘要 |
PURPOSE: A semiconductor device is provided to miniaturize a semiconductor device on a surface in parallel with a main surface of the semiconductor substrate. CONSTITUTION: A device isolation part, when it is seen from a vertical direction with respect to a main surface of a semiconductor substrate(1), surrounds a device region and electrically isolates one device region from another device region. A plurality of devices are installed in the device region, including the first and second FET(field effect transistor) transistors that function as a high side switch of a latch circuit. The semiconductor device is used while a portion under either one of the first or second FET transistor is completely depleted. The first and second FET transistors commonly use a source region and a drain region.
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申请公布号 |
KR20040080900(A) |
申请公布日期 |
2004.09.20 |
申请号 |
KR20030069865 |
申请日期 |
2003.10.08 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
TERASHIMA TOMOHIDE |
分类号 |
H01L21/822;H01L21/336;H01L21/8234;H01L27/04;H01L27/07;H01L27/08;H01L27/088;H01L29/739;(IPC1-7):H01L21/336 |
主分类号 |
H01L21/822 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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