| 摘要 |
PURPOSE: Provided is novel alicyclic methacrylate compounds having an oxygen substituent group on their alpha-methyl group which are useful as monomers for polymerization to form base resins for use in micropatterning resist compositions. CONSTITUTION: The alicyclic methacrylate having an oxygen substituent group on its alpha-methyl group is represented by the general formula (I), wherein R¬1 is hydrogen or an alkyl group of 1 to 10 carbon atoms which may contain a halogen atom, hydroxyl group, ether bond, carbonyl group, carboxyl group or cyano group, and R¬2 is a monovalent organic group of 3 to 20 carbon atoms having an alicyclic structure. The alicyclic methacrylate having an oxygen substituent group on its alpha-methyl group is represented by the general formula (II), wherein R¬1 is hydrogen or an alkyl group of 1 to 10 carbon atoms which may contain a halogen atom, hydroxyl group, ether bond, carbonyl group, carboxyl group or cyano group, and R¬3 is a tertiary alkyl group of 4 to 20 carbon atoms having an alicyclic structure. The alicyclic methacrylate having an oxygen substituent group on its alpha-methyl group is represented by the general formula (III), wherein R¬1 is hydrogen or an alkyl group of 1 to 10 carbon atoms which may contain a halogen atom, hydroxyl group, ether bond, carbonyl group, carboxyl group or cyano group, and R¬4 is an organic group of 4 to 20 carbon atoms having a lactone structure.
|
