发明名称 |
WELL STRUCTURE OF HIGH-VOLTAGE DEVICE TO IMPROVE BREAKDOWN VOLTAGE OF WELL AND PREVENT CHARGE-UP AND LATCH-UP |
摘要 |
PURPOSE: A well structure of a high-voltage device is provided to be capable of improving breakdown voltage of well and preventing charge-up and latch-up. CONSTITUTION: An N-well(22) is formed in a P-type substrate(21). A P-well(23) is formed in the substrate and spaced apart from the N-well. A field stop implant region(24) having same conductive type to the substrate is formed between the N-well and the P-well. A pick-up part(26) having same conductive type to the field stop implant region is formed to overlap the field stop implant region.
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申请公布号 |
KR20040080538(A) |
申请公布日期 |
2004.09.20 |
申请号 |
KR20030015373 |
申请日期 |
2003.03.12 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
PARK, SEONG GI |
分类号 |
H01L21/8238;H01L21/8247;H01L27/092;H01L27/115;H01L29/06;(IPC1-7):H01L29/78 |
主分类号 |
H01L21/8238 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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