发明名称 WELL STRUCTURE OF HIGH-VOLTAGE DEVICE TO IMPROVE BREAKDOWN VOLTAGE OF WELL AND PREVENT CHARGE-UP AND LATCH-UP
摘要 PURPOSE: A well structure of a high-voltage device is provided to be capable of improving breakdown voltage of well and preventing charge-up and latch-up. CONSTITUTION: An N-well(22) is formed in a P-type substrate(21). A P-well(23) is formed in the substrate and spaced apart from the N-well. A field stop implant region(24) having same conductive type to the substrate is formed between the N-well and the P-well. A pick-up part(26) having same conductive type to the field stop implant region is formed to overlap the field stop implant region.
申请公布号 KR20040080538(A) 申请公布日期 2004.09.20
申请号 KR20030015373 申请日期 2003.03.12
申请人 HYNIX SEMICONDUCTOR INC. 发明人 PARK, SEONG GI
分类号 H01L21/8238;H01L21/8247;H01L27/092;H01L27/115;H01L29/06;(IPC1-7):H01L29/78 主分类号 H01L21/8238
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