发明名称 METHOD FOR FORMING FUSE OF SEMICONDUCTOR DEVICE TO PREVENT SIDE-LOBE OF FUSE DUE TO OPTICAL PROXIMITY EFFECT
摘要 PURPOSE: A method for forming a fuse of a semiconductor device is provided to be capable of preventing the side-lobe of the fuse due to OPE(Optical Proximity Effect). CONSTITUTION: A fuse part of rectangle structure is prepared. The first serif(43) of isosceles triangle structure is formed at vertex portion of the rectangle structure. The second serif(45) is formed at inner side of the rectangle structure of the fuse so as to connect end portion of one side of the rectangle structure. The side of the rectangle structure has the thickness of 340-360 §^.
申请公布号 KR20040080237(A) 申请公布日期 2004.09.18
申请号 KR20030015135 申请日期 2003.03.11
申请人 HYNIX SEMICONDUCTOR INC. 发明人 NA, SANG HUN
分类号 H01L21/82;(IPC1-7):H01L21/82 主分类号 H01L21/82
代理机构 代理人
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