发明名称 |
OVERLAP MARK OF SEMICONDUCTOR DEVICE TO PREVENT MEASUREMENT ERROR AND TO IMPROVE SPACE MARGIN |
摘要 |
PURPOSE: An overlap mark of a semiconductor device is provided to prevent measurement error and to improve space margin by embedding simultaneously measure marks having different shape at a single position. CONSTITUTION: An overlap mark is provided with a single inner box(15) and two outer bars having different shape. The inner box is formed at a center portion. The first outer bars(11) are surrounded to the inner box. The second outer bars(13) are formed between the inner box and the first outer bars. The distance between the first and second bar is 10 micro meter.
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申请公布号 |
KR20040080239(A) |
申请公布日期 |
2004.09.18 |
申请号 |
KR20030015137 |
申请日期 |
2003.03.11 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
LEE, GYU SEONG |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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