SEMICONDUCTOR FABRICATION APPARATUS HAVING ANTI-POLLUTION DEVICE OF END-POINT DETECTION WINDOW

摘要

PURPOSE: A semiconductor fabrication apparatus having an anti-pollution device of an end-point detection window is provided to change traveling tracks of particles by forming magnetic field in an internal region of a process chamber adjacent to an end-point detection window. CONSTITUTION: A transparent end-point detection window(52) is used for observing plasma emission within a process chamber. An optical probe(60) is installed at an outer side of the transparent end-point detection window in order to converge the plasma emission. A magnetic generation unit(70) is installed at one side of the transparent end-point detection window in order to form magnetic field in an internal region of the process chamber adjacent to the transparent end-point detection window.