| 摘要 |
PURPOSE: Provided are a lithographic projection assembly having a lay out capable of using a limited amount of transporting means in order to effectively transfer substrates between a first environment, such as a substrate track, and a projection chamber generally containing a substrate stage, an apparatus for handling a substrate, a substrate handler assembly and a method for handling the substrate. CONSTITUTION: The lithographic projection assembly comprises at least two load locks (LL) for transferring a substrate between a first environment and a second environment having a lower pressure than that of the first environment, a substrate handler (SH) comprising a handler in which the second environment prevails, a lithographic projection apparatus (LP) comprising a projection chamber in which a handler chamber (HC) and a projection chamber communicate via a load position for inputting the substrate from the handler chamber into the projection chamber and an unload position for removing the substrate from the projection chamber into the handler chamber, pre-processing system to perform pre-processing tasks on the substrate, and a transport system to transfer the substrate from the load locks to the pre-processing system, transfer the substrate from the pre-processing system to the load position, and transfer the substrate from the unload position to the load locks.
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