APPARATUS FOR COATING PHOTOSENSITIVE MATERIAL, WHICH REMOVES THE IMPURITIES ADHERED TO A SUBSTRATE TO BE COATED

摘要

PURPOSE: An apparatus for coating photosensitive material is provided, to remove the impurities adhered to a substrate to be coated rapidly for preventing the inferiority of coating or the damage of a slit coater due to the impurities. CONSTITUTION: The apparatus for coating photosensitive material(800) comprises a base body(100) which loads a substrate where a photosensitive material is coated; a slit coater unit(200) which comprises a slit coater(210) for coating the photosensitive material on the substrate in face state with moving along the upper face of the base body and a transfer device(220) for transferring the slit coater; a detector(300) which is set in front of the slit coater and pre-detects the impurities adhered to the substrate by non-contact method; an impurities removing means(400) which removes the impurities detected by the detector; and a control part(500) which controls the slit coater unit, the detector and the impurities removing means.