| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a member which can obtain a high vacuum by improving the sealability of a chamber in a vacuum chamber. <P>SOLUTION: The member for the vacuum chamber holds a vacuum in a container 2 used for an apparatus for manufacturing a semiconductor, and includes the container 2 having a space for disposing a member to be worked and a cover plate 1 disposed in the opening of the container 2 via a sealing member 3. The surface roughness (Ra) of the surface brought into contact with at least the sealing member 3 of the cover plate 1 is 0.15 μm or less. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
