| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an acid-unstable group effective for a fluorine-containing compound; a fluorine-containing compound, a fluorine-containing polymerizable monomer, and a fluorine-containing polymer compound, all of them having an acid-unstable group or groups with high transparency and etching resistance; a photoresist using them; and a pattern formation method. <P>SOLUTION: The fluorine-containing compound has a fluorine atom or atoms and a group or groups represented by general formula (1) or (2) (wherein each of R<SP>1</SP>and R<SP>3</SP>is H, a linear or branched alkyl group, an aromatic group, or a hydrocarbon group optionally containing an alicyclic group and may further contain F, O, N, -CO-, or an alcohol; R<SP>2</SP>is H, F, methyl, or trifluoromethyl provided a plurality of R<SP>2</SP>'s may be on the same aromatic ring; and n is 0 or 1) in the molecule. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
