发明名称 ELECTRON BEAM AMOUNT DETECTOR AND ELECTRON BEAM IRRADIATION PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an electron beam amount detector in which the current of only primary electrons can be precisely detected, even when a low acceleration voltage is applied to an electron beam tube. SOLUTION: The electron beam amount detector 5 for measuring the amount of the electron beam emitted from the electron beam tube 1 has a current detector 50 positioned near a window 1d for emitting the electron beam of the electron beam tube 1 and disposed on the traveling path of the electron beam, and a current measurement part 51 for measuring the detection current detected by the current detection part 50. The surface of a base member consisting of a conductor or semiconductor is coated with an insulation film, in the current detector 50 in which the thickness of the insulation film on the surface on which the electron beam is incident is formed so as to be thinner than the thickness of the insulation film on which the electron beam is not incident. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004257869(A) 申请公布日期 2004.09.16
申请号 JP20030049173 申请日期 2003.02.26
申请人 USHIO INC 发明人 CHIGA TAKEHITO
分类号 B41F23/04;G01T1/29;G21K5/04;H01J37/04;H01J37/244;(IPC1-7):G01T1/29 主分类号 B41F23/04
代理机构 代理人
主权项
地址