发明名称 |
UPPER ELECTRODE PLATE WITH DEPOSITION SHIELD IN A PLASMA PROCESSING SYSTEM |
摘要 |
The present invention presents an improved upper electrode (22) for a plasma processing system, wherein the design and fabrication on an electrode plate (24) with a deposition shield (26) coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior. |
申请公布号 |
WO2004030020(A3) |
申请公布日期 |
2004.09.16 |
申请号 |
WO2003IB04923 |
申请日期 |
2003.09.29 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
NISHIMOTO, SHINYA;MITSUHASHI, KOUJI;NAKAYAMA, HIROYUKI |
分类号 |
C23C16/44;H01J37/32 |
主分类号 |
C23C16/44 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|