发明名称 PHOTOSENSITIVE RESIN, COMPOSITION AND METHOD FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition affording a photosensitive layer with high sensitivity and further having excellent adhesiveness during developing and to provide a method for producing the composition. <P>SOLUTION: The alkali-soluble photosensitive resin is an &alpha;,&beta;-unsaturated group-containing carboxylic acid compound prepared by adding a polybasic carboxylic acid anhydride to a polyhydric alcohol compound represented by general formula (1) and having the &alpha;,&beta;-unsaturated groups. The acid value is 20-150 expressed in terms of solid content. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004256584(A) 申请公布日期 2004.09.16
申请号 JP20030045838 申请日期 2003.02.24
申请人 TOPPAN PRINTING CO LTD;OSAKA ORGANIC CHEM IND LTD 发明人 DEMACHI YASUYUKI;USUKI JUNJI;ITOI TAKESHI;TANI MIZUHITO;MEGATA HIDEYUKI;DOBASHI KOJI
分类号 G03F7/027;C08G63/52 主分类号 G03F7/027
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