发明名称 |
PHOTOSENSITIVE RESIN, COMPOSITION AND METHOD FOR PRODUCING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition affording a photosensitive layer with high sensitivity and further having excellent adhesiveness during developing and to provide a method for producing the composition. <P>SOLUTION: The alkali-soluble photosensitive resin is an α,β-unsaturated group-containing carboxylic acid compound prepared by adding a polybasic carboxylic acid anhydride to a polyhydric alcohol compound represented by general formula (1) and having the α,β-unsaturated groups. The acid value is 20-150 expressed in terms of solid content. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
申请公布号 |
JP2004256584(A) |
申请公布日期 |
2004.09.16 |
申请号 |
JP20030045838 |
申请日期 |
2003.02.24 |
申请人 |
TOPPAN PRINTING CO LTD;OSAKA ORGANIC CHEM IND LTD |
发明人 |
DEMACHI YASUYUKI;USUKI JUNJI;ITOI TAKESHI;TANI MIZUHITO;MEGATA HIDEYUKI;DOBASHI KOJI |
分类号 |
G03F7/027;C08G63/52 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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