发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND CURING PRODUCT THEREOF
摘要 A photosensitive resin composition that excels in sensitivity to actinic energy rays (photosensitivity), is hardenable within a short period of time and can form pattern through development with a dilute aqueous alkali solution and that gives a cured film through thermal curing in the postcuring step, the cured film having satisfactory flexibility and being suitable to a solder mask ink of high insulation excelling in adherence and resistances to gold plating, electroless gold plating and tin plating; and a curing product thereof. In particular, a photosensitive resin composition characterized by comprising (1) a urethane resin soluble in aqueous alkali solutions (A), the urethane resin obtained by urethanizing in the absence of catalyst a diisocyanate compound (a), a diol compound having an ethylenically unsaturated group in its molecule (b) and a diol compound having a carboxyl group in its molecule (c) optionally together with a diol compound not having any ethylenically unsaturated group or carboxyl group in its molecule (d) and reacting the reaction product with a cyclic acid anhydride (e); (2) a photopolymerization initiator (B); and (3) a reactive crosslinking agent (C).
申请公布号 WO2004079452(A1) 申请公布日期 2004.09.16
申请号 WO2004JP02718 申请日期 2004.03.04
申请人 NIPPON KAYAKU KABUSHIKI KAISHA;TANAKA, RYUTARO;KOYANAGI, HIROO 发明人 TANAKA, RYUTARO;KOYANAGI, HIROO
分类号 C08F290/06;C08G18/48;C08G18/50;C08G18/77;C09J175/04;G03F7/027;G03F7/038;(IPC1-7):G03F7/027;C08G18/67;G03F7/035 主分类号 C08F290/06
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