| 摘要 |
PROBLEM TO BE SOLVED: To shorten the entire film deposition time. SOLUTION: A substrate holder 5 with substrates 4a, 4b, 4c and 4d set thereto is rotatably fitted to a center of an upper wall of a vacuum chamber 1 by a motor 7 via a rotary shaft 6, and a crucible 12 comprising a rotating body 10 with recessed parts 9a, 9b, 9c and 9d to store evaporation materials 8a, 8b, 8c and 8d formed on the same radius close to the circumference and a rotary shaft 11 is rotatably fitted to a bottom wall below the substrate holder 5 by a motor 13 via the rotary shaft 11. A vacuum vapor deposition apparatus has an electron gun 14 to generate electron beams to shock the evaporation material in the recessed part at the vapor deposition position to evaporate the evaporation material, and an electron gun 21 to generate electron beams to preliminarily heat the evaporation material in the recessed parts at the preliminary heating position. COPYRIGHT: (C)2004,JPO&NCIPI
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