| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device capable of providing a uniform plasma density distribution. <P>SOLUTION: A gas passages 6 for introducing a process gas to release it into a chamber 10 is formed in a microwave introduction window 2. The gas passage 6 is branched so as to have two or more gas discharge ports 9 for releasing the introduced process gas for one gas introduction port 7 for introducing the process gas. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
