发明名称 ELECTRON BEAM LITHOGRAPHIC DEVICE AND METHOD OF MEASURING ITS SETTLING TIME
摘要 PROBLEM TO BE SOLVED: To enable the settling time of a high-speed deflection controlling circuit to be easily measured with high reliability. SOLUTION: The high-speed deflection controlling circuit is equipped with two discrete deflection circuits, and the outputs of the two discrete deflection circuits are used. Deflection data are inputted into one of the two discrete deflection circuits, other deflection data opposite in polarity to the former deflection data are inputted into the other discrete deflection circuit, DA conversion start timing of one or two of the deflection data is varied so as to see a correlation between the discrete deflection circuits as a voltage change is measured at an intermediate point between measuring resistors connected to the output sides of the two discrete deflection circuits, whereby the settling time of the high-speed deflection controlling circuit can be easily measured with high reliability. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004259812(A) 申请公布日期 2004.09.16
申请号 JP20030046905 申请日期 2003.02.25
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TODA HIROSHI;ANDO HIROZUMI
分类号 G03F7/20;H01J37/147;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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