发明名称 Solder on a sloped surface
摘要 A method for depositing a solder layer or solder bump on a sloped surface. The method includes etching a sloped surface on a planar semiconductor substrate, depositing a solder-wettable layer on the sloped surface, masking the wettabler layer with a coating layer to control the position of the solder deposition, and using an organic film to prevent the solder from being deposited at regions not above either the wettable layer or the coating layer. Also, a semiconductor device structure on which a solder layer or solder bump is formed exclusively on a sloped surface.
申请公布号 US2004180526(A1) 申请公布日期 2004.09.16
申请号 US20030698725 申请日期 2003.10.30
申请人 PLAS HUBERT ALLEN VANDER;BERAUER FRANK 发明人 PLAS HUBERT ALLEN VANDER;BERAUER FRANK
分类号 H01L21/60;H01L23/485;H01L29/06;H05K3/34;H05K3/40;(IPC1-7):H01L21/44 主分类号 H01L21/60
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