| 摘要 |
PURPOSE: A photo mask for manufacturing a semiconductor device is provided to minimize stray light effect by adding a dummy pattern to a scribe lane. CONSTITUTION: A photo mask(100) includes a shot region(110) and a scribe lane(A,B,C,D) located at edge portions of the shot region. The scribe lane further includes a desired dummy pattern located in the scribe lane and a subsidiary scribe lane(A',B',C',D') located outside of the scribe lane and spaced apart from the scribe lane.
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