| 摘要 |
PROBLEM TO BE SOLVED: To execute data processing for generating exposure pattern data from design data more efficiently. SOLUTION: In an electrically-charged particle beam exposure method irradiating an exposure test piece with an electrically-charged particle beam passed through a blocking mask having a plurality of transmitting hole patterns, the method comprises processes of; designating a minimum line width candidate for the pattern data in the blocking mask; setting a representative line width in such a way that when the minimum line width of the pattern data in the blocking mask is narrower than that of the above-mentioned candidate, the minimum line width candidate is set to be the representative line width, and when the minimum line width of the pattern data in the blocking mask is wider than that of the candidate, the minimum line width of the pattern data is set to be the representative line width, and the mean length of the pattern having the representative line width is determined for setting an exposure light quantity corresponding to the pattern of the representative line width and a mean length to be the exposure light quantity of the blocking mask; and irradiating the above-mentioned exposure test piece by making the electrically-charged particle beam having a pre-determined exposure light quantity pass through the blocking mask. COPYRIGHT: (C)2004,JPO&NCIPI
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