发明名称 |
Compensation frame for holding substrate for semiconducting manufacture has polygonal inner profile for holding substrate, area of upper main surface of frame with different widths at different points |
摘要 |
The frame (2) has an inner contour for holding a substrate (1), a region (3a) of an upper main surface at a defined height above the substrate in the frame and a further region (3b) at essentially the same height as the plane of the upper main surface (1a) of the substrate in the frame. The inner profile is polygonal for accommodating the substrate and the further area of the upper main surface of the frame has different widths at different points. |
申请公布号 |
DE10260645(B3) |
申请公布日期 |
2004.09.16 |
申请号 |
DE2002160645 |
申请日期 |
2002.12.23 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
RUHL, GUENTHER;PRECHTL, GERHARD DR.;SABISCH, WINFRIED;KERSCH, ALFRED;NESLADEK, PAVEL;GANS, FRITZ;ANDERSON, REX |
分类号 |
G03F1/00;H01J37/32;H01L21/00;H01L21/687 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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