Process for locally etching a substrate used in the production of electron emitting devices comprises etching the insulating layer under the action of heat after etching the conducting layer, and forming a recess in the insulating layer

摘要

Process for locally etching a substrate consisting of a metallic conducting layer and an insulating layer comprises etching the insulating layer under the action of heat after etching the conducting layer, and forming a recess in the insulating layer by etching the insulating layer with the depth being determined by the duration of the feed of the laser beam. An independent claim is also included for a device for carrying out the process comprising: a closed chamber having a connection for introducing a gas atmosphere to the chamber; a substrate holder and a laser device for directing a laser beam, preferably through a window of the chamber, onto the substrate. A power adjusting unit is assigned to the laser device.