发明名称 Beam Homogenizer, laser irradiation apparatus, and method of manufacturing a semiconductor device
摘要 The present invention provides a beam homogenizer being equipped with an optical waveguide having a pair of reflection planes provided oppositely, having one end surface into which the laser beam is incident, and having the other end surface from which the laser beam is emitted in the optical system for forming the beam spot. The optical waveguide is a circuit being able to keep radiation light in a certain region and to transmit the radiation light in such a way that the energy flow thereof is guided in parallel with an axis of the channel.
申请公布号 US2004179807(A1) 申请公布日期 2004.09.16
申请号 US20040793786 申请日期 2004.03.08
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TANAKA KOICHIRO
分类号 H01S5/10;B23K26/00;B23K26/06;B23K26/073;G02B27/09;H01L21/3213;H01L21/77;H01L21/84;(IPC1-7):G02B6/10 主分类号 H01S5/10
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