发明名称 Determining chromatic aberration in scanning microscope, by determining scan position at which detected light has power extremes, for multiple detection wavelengths
摘要 <p>The method involves scanning a sample having reference structures using an illumination light beam, and detecting the light leaving the sample in dependence on the scan position at a detection wavelength or in a spectral range. The scan position is determined at which the detected light has power extremes. The light leaving the sample is detected at a further wavelength or spectral range, and further scan positions of power extremes are determined. The chromatic aberration is determined from the scan positions. An independent claim is included for a scanning microscope.</p>
申请公布号 DE10309911(A1) 申请公布日期 2004.09.16
申请号 DE2003109911 申请日期 2003.03.07
申请人 LEICA MICROSYSTEMS HEIDELBERG GMBH 发明人 BORLINGHAUS, ROLF
分类号 G02B21/00;(IPC1-7):G02B21/00 主分类号 G02B21/00
代理机构 代理人
主权项
地址