ELECTROMAGNETIC RADIATION SENSOR AND METHOD FOR FABRICATING THE SAME

摘要

An SiO2 layer (3), a Ti layer (4), a Pt layer (5), a PLZT layer (6) and an IrO2 layer (7) are formed sequentially on an Si substrate (2). The IrO2 layer (7) functioning as an upper electrode has a thickness of about 100 nm. Since the IrO2 layer (7) has a conductivity lower than that of the Pt layer conventionally used as the upper electrode and a skin depth deeper than that of the Pt layer, sufficient sensitivity can be attained using an IrO2 layer of about 100 nm thick.