| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing device, capable of fundamentally eliminating the electrostatic fault or the like by a simple method, a substrate processing method and a manufacturing method of a substrate, using the processing method, and a manufacturing device of a liquid crystal device, using the manufacturing method and a manufacturing method of the liquid crystal device. SOLUTION: A substrate processing device 1 has a means for removing moisture in the processing chamber. Consequently, the dielectric constant increase and residual absorbing force becoming large by the adhesion of the moisture are prevented, and the releasing property of a substrate 2 from an electrostatic chuck 19 deteriorates rapidly, without the adhesion of the moisture on a mating surface of the electrostatic chuck 19 and the substrate 2, when the electrostatic chuck 19 provided on a mounting stand 14 is used. Moreover, the surface potential discharging on a treatment side surface of the substrate 2 and an element being damaged is prevented, by remarkedly increasing the surface potential at removal from the electrostatic chuck 19 of the substrate 2. COPYRIGHT: (C)2004,JPO&NCIPI |
