发明名称 Pattern drawing apparatus and pattern drawing method for forming patterns, that have mirror image relationship to each other with respect to a substrate, on both sides of the substrate, and test apparatus for use in the pattern drawing apparatus
摘要 A pattern drawing apparatus for forming patterns, that have a mirror image relationship to each other with respect to a substrate, on both sides of the substrate forms the patterns on both sides of the substrate by drawing the patterns directly on both sides of the substrate in accordance with prescribed data by using a direct drawing means such as a maskless exposure means or an inkjet patterning means.
申请公布号 US2004179050(A1) 申请公布日期 2004.09.16
申请号 US20040790872 申请日期 2004.03.03
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 AKAGAWA MASATOSHI;SEKIGAWA KAZUNARI
分类号 G03F7/207;B41J29/393;H01L23/50;(IPC1-7):B41J29/38 主分类号 G03F7/207
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