METHOD FOR MONITORING ANNEALING PROCESS BY MEASURING THERMAL WAVE VALUE OF PRE-ANNEALING PROCESS AND THERMAL WAVE VALUE OF POST-ANNEALING PROCESS

摘要

PURPOSE: A method for monitoring an annealing process is provided to monitor an annealing process by measuring a thermal wave value of a pre-annealing process and a thermal wave value of a post-annealing process and applying the thermal wave values to reference data. CONSTITUTION: A thermal wave value of a pre-annealing process is measured from a semiconductor substrate(110). An annealing process is performed on the semiconductor substrate(120). A thermal wave value of a post-annealing process is measured from the semiconductor substrate(130). The thermal wave value of the pre-annealing process and the thermal wave value of the post-annealing process are compared with reference data(140).