Lithographic apparatus comprising a temperature conditioned load lock

摘要

Load lock for a lithographic apparatus arranged to transfer an object, like a substrate (W), into and from the lithographic apparatus. The load lock outer wall (38'; 40) defining at least part of a load lock volume accommodating a support unit (33; 141) for supporting the object (W) when in said load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus. <IMAGE>