发明名称 Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus
摘要 The invention relates an assembly comprising a sensor for determining at least one of tilt and height of a surface of a substrate (W; 11) in a lithographic projection apparatus (1). The substrate (W; 11) being moveable along at least one path substantially parallel to the surface of the substrate with respect to the sensor. The lithographic projection apparatus having an exposure scanning direction (y), the assembly being arranged to continuously move the substrate relative to said sensor along said at least one path and to provide measurement data about said at least one of tilt and height along said at least one path. The assembly comprising a memory (10) for storing said measurement data for use during a later exposure of said substrate by said lithographic projection apparatus. Said at least one path of the substrate being at least partly at an angle to the exposure scanning direction.
申请公布号 EP1457839(A2) 申请公布日期 2004.09.15
申请号 EP20040075784 申请日期 2004.03.10
申请人 ASML NETHERLANDS B.V. 发明人 BRINKHOF, RALPH;BOONMAN, MARCUS EMILE JOANNES;DE NIVELLE, MARTIN JULES MARIE-EMILE
分类号 G03F9/00;(IPC1-7):G03F9/00 主分类号 G03F9/00
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