| 摘要 |
A substrate (20) for a MEMS device includes a base material (40) having a first side (42), a poly silicon strain gage (30) formed on the first side of the base material, a dielectric material (52) disposed over the strain gage, and a conductive material (62) in communication with the strain gage through the dielectric material, wherein the substrate is adapted to have at least one opening (26) formed therethrough, and wherein the strain gage is adapted to be formed adjacent the at least one opening. <IMAGE>
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