发明名称 Method for producing a semiconductor component comprising a t-shaped contact electrode
摘要 In order to fabricate a semiconductor component having a contact electrode that is T-shaped in cross section, in particular a field-effect transistor with a T gate, a method is described in which a self-aligning positioning of gate base and gate head is effected by means of a spacer produced on a material edge.
申请公布号 US6790717(B2) 申请公布日期 2004.09.14
申请号 US20030466530 申请日期 2003.07.17
申请人 UNITED MONOLITHIC SEMICONDUCTORS GMBH 发明人 BEHAMMER DAG
分类号 H01L29/423;H01L21/285;H01L21/335;H01L21/338;H01L29/41;H01L29/812;(IPC1-7):H01L21/338 主分类号 H01L29/423
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