发明名称 Exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
摘要 A linear motor apparatus includes a movable member having a magnet, and a coil wound about the magnet so as to generate a drive force for driving the movable member and having a multi-layer structure formed by winding a foil-like conductor and an insulating layer. The foil-like conductor (i) has a plurality of partial coils having identical current application/rotation directions, and the plurality of partial coils are formed in such a way that the foil-like conductor forms a continuous, seamless strip, and (ii) is continuously wound in a multilayered, aligned state to form the coil, and adjacent layers of the foil-like conductor are insulated by the insulating layer.
申请公布号 US6791670(B2) 申请公布日期 2004.09.14
申请号 US20010022506 申请日期 2001.12.20
申请人 CANON KABUSHIKI KAISHA 发明人 MIYAJIMA YOSHIKAZU;OUTUKA KAZUHITO;EMOTO KEIJI
分类号 G03F7/20;H01L21/027;H02K3/02;H02K3/04;H02K3/34;H02K3/47;H02K41/02;H02K41/03;(IPC1-7):G03B27/42;G03B27/58;G03B27/62;G03B27/32 主分类号 G03F7/20
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