发明名称 |
Elements having erosion resistance |
摘要 |
A component of a plasma reactor chamber for processing a semiconductor workpiece, the component being a monolithic ceramic piece formed from a mixture of yttrium aluminum perovskite (YAP) and yttrium aluminum garnet (YAG) formed from a mixture of yttria and alumina powders, the ratio the powders in said mixture being within a range between one ratio at which at least nearly pure yttrium aluminum perovskite is formed and another ratio at which at least nearly pure yttrium aluminum garnet is formed.
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申请公布号 |
US6789498(B2) |
申请公布日期 |
2004.09.14 |
申请号 |
US20020085670 |
申请日期 |
2002.02.27 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
KAUSHAL TONY S.;DAM CHUONG QUANG;ASHKIN DANIEL |
分类号 |
C23C16/458;H01J37/32;(IPC1-7):C23C6/00;C23F1/00;H01L21/00 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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