发明名称 Elements having erosion resistance
摘要 A component of a plasma reactor chamber for processing a semiconductor workpiece, the component being a monolithic ceramic piece formed from a mixture of yttrium aluminum perovskite (YAP) and yttrium aluminum garnet (YAG) formed from a mixture of yttria and alumina powders, the ratio the powders in said mixture being within a range between one ratio at which at least nearly pure yttrium aluminum perovskite is formed and another ratio at which at least nearly pure yttrium aluminum garnet is formed.
申请公布号 US6789498(B2) 申请公布日期 2004.09.14
申请号 US20020085670 申请日期 2002.02.27
申请人 APPLIED MATERIALS, INC. 发明人 KAUSHAL TONY S.;DAM CHUONG QUANG;ASHKIN DANIEL
分类号 C23C16/458;H01J37/32;(IPC1-7):C23C6/00;C23F1/00;H01L21/00 主分类号 C23C16/458
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