发明名称 Combined adhesion promotion and direct metallization process
摘要 A combined adhesion promotion method of a metal to a non-conductive substrate and directly metallizing the non-conductive substrate with the metal. The method involves texturing a non-conductive substrate with a cobalt etch followed by applying a sulfide to the textured non-conductive substrate to provide an electrically conductive surface on the non-conductive substrate. After the surface of the non-conductive substrate has been made electrically conductive, the surface of the non-conductive substrate can be directly metallized. The method reduces the number of process steps for direct metallization of a non-conductive substrate. Thus, the method is more efficient in contrast to conventional methods of metallizing a non-conductive substrate.
申请公布号 US6790334(B2) 申请公布日期 2004.09.14
申请号 US20020210535 申请日期 2002.08.02
申请人 SHIPLEY COMPANY, L.L.C. 发明人 BEGUM ZATOON;GOOSEY MARTIN T.;GRAVES JOHN E.;POOLE MARK A.;SINGH AMRIK
分类号 C25D5/54;C25D5/56;H05K3/18;(IPC1-7):C25D5/54;C25D5/34 主分类号 C25D5/54
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