发明名称 SPIN COATER FOR TRANSFERRING SUBSTRATE HORIZONTALLY AT CONSTANT HEIGHT IRRESPECTIVE OF THE SIZE OF DEVICE ROTATING SUBSTRATE
摘要 PURPOSE: A spin coater is provided, to allow a substrate to be transferred horizontally at a constant height irrespective of the size of a device rotating a substrate, thereby reducing the substrate transfer time. CONSTITUTION: The spin coater comprises a spin unit(100) which comprises a substrate fixing device(110) for fixing a substrate horizontally transferred at a first height(H1) from the bottom(2) by a substrate transfer device and a rotation device(120) for rotating the substrate fixing device; a height control means(600) which controls the height of the spin unit to the bottom so as to allow a second height(H2) defined by the first bottom and the substrate fixing device to be equal to the first height; and a photosensitive material supply device(300) which supplies a photosensitive material to the substrate. Preferably the height control means is a groove formed on the bottom to allow the second height to be equal to the first height.
申请公布号 KR20040079089(A) 申请公布日期 2004.09.14
申请号 KR20030014012 申请日期 2003.03.06
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, DONG UK;KIM, SEONG BONG
分类号 G03F7/16;(IPC1-7):G03F7/16 主分类号 G03F7/16
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