发明名称 Particle deposition system and method
摘要 A deposition system for depositing a chemical vapor onto a workpiece, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.
申请公布号 US6789401(B1) 申请公布日期 2004.09.14
申请号 US20010894447 申请日期 2001.06.28
申请人 ASI/SILICA MACHINERY, LLC 发明人 DABBY FRANKLIN W.;ORCHANIAN BEDROS
分类号 C03B37/014;(IPC1-7):C03B8/04 主分类号 C03B37/014
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