SEMICONDUCTOR FABRICATION APPARATUS, FOR OPENING AND CLOSING WAFER TRANSFER GATE WITHOUT LEAKAGE

摘要

PURPOSE: A semiconductor fabrication apparatus is provided to reduce process errors due to particles by opening and closing correctly a wafer transfer gate without a leakage of an outer door. CONSTITUTION: A wafer loading unit(120) is installed at an outside of a main body(110) in order to load a wafer. A process chamber is installed in the inside of the main body. A load lock chamber(140) is installed closely to the wafer loading unit of the inside of the main body. A transfer chamber(160) is installed in the inside of the main body in order to transfer the wafer from the wafer loading part to the load lock chamber and the process chamber. The first wafer transfer gate(141) is installed at the main body between the wafer loading unit and the load lock chamber. An outer door(121) is installed at the outside of the main body in order to open and close selectively the first wafer transfer gate. A door driving unit is installed in the inside of the main body in order to rotate the outer door. A door stopping block(130) is installed at the outside of the main body in order to stop the outer door.