发明名称 SUBSTRATE PROCESSING APPARATUS OF TRANSFER TYPE
摘要 Chemical contamination at the receiving unit on the upstream side is prevented even if chemical discharge is started in a chemical processing unit on the downstream side in the stage where a substrate 10 passes through the outlet port of a chemical avoiding unit 30. The chemical avoiding unit 30 is partitioned into chambers 33a, 33b, 33c arranged in the direction of the substrate transfer by at least one partition 32a, 32b. At least one chamber 33b except the chamber 33a at the end of the upstream side in the chemical avoiding unit 30 is brought into a negative-pressure state. The pressure of the chamber 33a is controlled at a normal or positive value. The positions of the partitions are determined so that the trailing end of the substrate 10 may come out of the chamber 33a when the leading end of the substrate 10 reaches the chemical discharge starting point in the chemical processing unit on the downstream side. Preferable, the positions of the partitions are determined so that the trailing end of the substrate enter the chamber 33c at the end of the downstream side in the chemical avoiding unit 30 when the when the leading end of the substrate 10 reaches the chemical discharge starting point.
申请公布号 KR20040078684(A) 申请公布日期 2004.09.10
申请号 KR20047011860 申请日期 2002.02.04
申请人 发明人
分类号 G02F1/13;B65G49/00;B65G49/06;B65G49/07;H01L21/00;H01L21/306;H01L21/677;H01L21/68 主分类号 G02F1/13
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