发明名称 SEMICONDUCTOR MEMORY WITH VERTICAL MEMORY TRANSISTORS IN A CELL FIELD ARRANGEMENT WITH 1-2F<2 >CELLS
摘要 The invention relates to a semiconductor memory with a number of memory cells, whereby each of the memory cells comprises four vertical memory transistors with trapping layers. The shallower contact regions are embodied in a semiconductor region running at an angle to the lines and gaps of the cell field, whereby the gate electrode preferably runs on the stage lateral surfaces of the shallower semiconductor region. A memory density of 1-2F<2> per bit may thus be achieved.
申请公布号 WO2004023557(A3) 申请公布日期 2004.09.10
申请号 WO2003EP09296 申请日期 2003.08.21
申请人 INFINEON TECHNOLOGIES AG;HOFMANN, FRANZ;LANDGRAF, ERHARD;LUYKEN, RICHARD, JOHANNES;SCHULZ, THOMAS;SPECHT, MICHAEL 发明人 HOFMANN, FRANZ;LANDGRAF, ERHARD;LUYKEN, RICHARD, JOHANNES;SCHULZ, THOMAS;SPECHT, MICHAEL
分类号 H01L21/20;H01L21/28;H01L21/336;H01L21/8246;H01L27/10;H01L27/115;H01L29/73;H01L29/76;H01L29/792 主分类号 H01L21/20
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