发明名称 |
Substrate processing apparatus and method for the controlled formation of layers including self-assembled monolayers |
摘要 |
Substrate processing methods and apparatuses are disclosed. One embodiment of the invention is directed to a substrate processing apparatus for processing an analytical substrate. The apparatus includes a substrate holder for holding a substrate and a processing chamber including an opening for receiving the substrate holder and the substrate. A fluid inlet and a fluid outlet are in the processing chamber. A washing device adapted to supply a wash liquid to the substrate while the substrate is in the processing chamber. A liquid removal device adapted to dry the substrate when the substrate is being withdrawn from the processing chamber. |
申请公布号 |
US2004175504(A1) |
申请公布日期 |
2004.09.09 |
申请号 |
US20030384187 |
申请日期 |
2003.03.06 |
申请人 |
ZYOMYX, INC. |
发明人 |
HASSELBLATT MARKUS;WAGNER PETER;KERNEN PETER;ZAUGG FRANK;DE LA SALLE OLIVIER |
分类号 |
B01L9/00;C40B60/14;G01N1/34;H01L21/00;H01L51/00;H01L51/40;(IPC1-7):B05D3/00;H01L21/311;H01L21/31;H01L21/469 |
主分类号 |
B01L9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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